Chemical vapor deposition (CVD) is a
chemical process used to produce high quality, high-performance, solid materials. The process is often used in the
semiconductor industry to produce
thin films. In typical CVD, the
wafer (substrate) is exposed to one or more
volatile , which
react and/or
decompose on the substrate surface to produce the desired deposit. Frequently, volatile
by-products are also produced, which are removed by gas flow through the reaction chamber.